Graphite Components for Ion Implantation
These components play a critical role in the ion implantation process by precisely controlling the implantation dose, energy, and uniformity. These components, including ion source parts, beamline elements, and wafer handling systems, ensure the accurate delivery of ions into the substrate, optimizing doping concentration and distribution. Their high precision and durability contribute to process stability, improved device performance, and extended equipment lifespan.
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